On-the-fly photoresist exposure apparatus

Details On-the-fly photoresist exposure apparatus On-the-fly photoresist exposure apparatus

1976-12-27

1978-06-20

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Original moves continuously

354 4, 355 54, 355 63, 355 71, G03B 2748, G03B 2750

Patent

active

040958914

ABSTRACT:
A system for exposing photoresists "on-the-fly" is disclosed. The system incorporates a dye laser having an output pulse duration of less than about 250 nanoseconds to expose the photoresist while the photoresist is moving. Means are provided to synchronize the output of the laser to the motion of a photoresist coated surface and to insure spatial uniformity of energy across an object plane of an optical projection system.

REFERENCES:
patent: 3903536 (1975-09-01), Westerberg
patent: 4023126 (1977-05-01), Schlafer

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