On-site manufacture of ultra-high-purity hydrofluoric acid for s

Details On-site manufacture of ultra-high-purity hydrofluoric acid for s On-site manufacture of ultra-high-purity hydrofluoric acid for s

1998-03-03

2000-05-16

Nguyen, Ngoc-Yen

Chemistry of inorganic compounds

Halogen or compound thereof

Hydrogen halide

423488, C01B 719

Patent

active

060633565

ABSTRACT:
A system for purification and generation of hydrofluoric acid on-site at a semiconductor device fabrication facility. An evaporation stage (optionally with arsenic oxidation) is followed by a fractionating column to remove most other impurities, an Ionic Purifier column to suppress contaminants not removed by the fractionating column, and finally the HF Supplier (HFS).

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patent: 4832935 (1989-05-01), Lester et al.
patent: 5318706 (1994-06-01), Ohmi et al.
patent: 5437848 (1995-08-01), Hard
patent: 5632866 (1997-05-01), Grant

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