On-site manufacture of ultra-high-purity hydrofluoric acid for s

Details On-site manufacture of ultra-high-purity hydrofluoric acid for s On-site manufacture of ultra-high-purity hydrofluoric acid for s

1996-07-01

1998-07-28

Bhat, Nina

Distillation: apparatus

Apparatus

Systems

202161, 202172, 202200, 159 471, 423484, 423488, 203 39, B01D 314

Patent

active

057858209

ABSTRACT:
A system for purification and generation of hydrofluoric acid on-site at a semiconductor device fabrication facility. An evaporation stage (optionally with arsenic oxidation) is followed by a fractionating column to remove most other impurities, an Ionic Purifier column to suppress contaminants not removed by the fractionating column, and finally the HF Supplier (HFS).

REFERENCES:
patent: 4756899 (1988-07-01), Jenczewski et al.
patent: 4828660 (1989-05-01), Clark et al.
patent: 4929435 (1990-05-01), Boghean et al.
patent: 4952386 (1990-08-01), Davison et al.
patent: 4980032 (1990-12-01), Dobson et al.
patent: 5164049 (1992-11-01), Clark et al.
patent: 5288333 (1994-02-01), Tanaka et al.
patent: 5346557 (1994-09-01), Ito et al.
patent: 5362469 (1994-11-01), Seseke-Koyro et al.
patent: 5496778 (1996-03-01), Hoffman et al.
patent: 5500098 (1996-03-01), Brown et al.

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