On-site manufacture of ultra-high-purity hydrochloric acid for s

Distillation: processes – separatory – With disparate physical separation – Of entrained particles from a vapor or gas

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203 43, 203 61, 202158, 202168, 202181, 202182, 2021851, 423483, 423484, 134 10, B01D 300, B01D 4500, C01B 719

Patent

active

058463879

ABSTRACT:
Highly purified HCl for use in semiconductor manufacturing is prepared on-site by drawing HCl vapor from a liquid HCl reservoir, and scrubbing the filtered vapor in a low-pH aqueous scrubber.

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