On-site generation of ultra-high-purity buffered-HF for semicond

Details On-site generation of ultra-high-purity buffered-HF for semicond On-site generation of ultra-high-purity buffered-HF for semicond

1996-07-01

1998-03-03

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134111, 134105, 134902, 210900, B08B 310

Patent

active

057224420

ABSTRACT:
A process for preparing ultra-high-purity buffered hydrofluoric acid on-site at a semiconductor manufacturing facility (front end). Anhydrous ammonia is purified by scrubbing in a high-pH liquor, and then combined with high-purity aqueous HF which has been purified by a similar process. The generation is monitored by a density measurement to produce an acid whose pH and buffering are accurately controlled.

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