Distillation: processes – separatory – Distilling to separate or remove only water
Patent
1998-03-10
1999-12-14
Bhat, Nina
Distillation: processes, separatory
Distilling to separate or remove only water
203 40, 203 42, 423237, 423238, 423352, 95226, 95232, B01D 300
Patent
active
060012234
ABSTRACT:
Highly purified ammonia for use in semiconductor manufacturing is prepared on-site by drawing ammonia vapor from a liquid ammonia reservoir, passing the vapor through a filter capable of filtering out particles of less than 0.005 micron in size, and scrubbing the filtered vapor in a high-pH aqueous scrubber.
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Clark R. Scot
Hoffman Joe G.
Air Liquide America Corporation
Bhat Nina
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