On machine reticle inspection device

Details On machine reticle inspection device On machine reticle inspection device

1981-05-18

1984-04-17

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

356390, 356394, G03B 2742

Patent

active

044430965

ABSTRACT:
A device is disclosed for use on a projection type semiconductive wafer precision step-and-repeat alignment and exposure system for on-machine inspection of a reticle containing the circuitry to be printed on the wafer. Two apertured optical detectors are aligned with identical portions of the projected image of the reticle and scanned across the image of the reticle. Any difference in the electrical response of the two optical detectors indicates dirt or a flaw in the reticle.

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Solid State Technology, vol. 23, No. 6, Jun. 1980, pp. 80-84, S. Wittkeok: "Step-and-Repeat Wafer Imaging".
Elektronik, vol. 27, No. 11, Oct. 1978, pp. 59-66, H. Schaumburg: "Neue Lithografieverfahren in der Halbleitertechnik".
Solid State Technology, vol. 23, No. 8, Aug. 1980, p. 92, "The Unique Fully Automatic Direct Wafer Steppers From Optimetrix Are Now In Production".

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