On-line monitor for moisture contamination in HCL gas and copper

Radiant energy – Invisible radiant energy responsive electric signalling – Infrared responsive

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250373, G01N 2117

Patent

active

055788297

ABSTRACT:
A light beam is passed through a tube containing a material being monitored and a contaminant wherein the light is absorbed by the contaminant or some form of the contaminant to the exclusion of the material being monitored. Since the amount of light passing through the tube is a function of the amount of contaminant in the tube, the amount of light detected at the downstream end of the tube is a function of the amount of contaminant in the material being monitored. The detected light can be used to provide a quantitative indication of the contaminant, to provide an alarm, to shut down the system to which the material being monitored is being delivered or for other purposes. When the material being monitored is HCl gas and the contaminant is moisture, the tube will generally be stainless steel to avoid galvanic effects since the remainder of the pipe system is generally also stainless steel and the light frequency will be from about 1.0 to about 2.0 micrometers which is a range of frequencies selective to water as opposed to HCl gas. When the material being monitored is aqueous ammonium hydroxide and the contaminant is a transition metal, preferably copper, the tube will be formed of a material inert to ammonium hydroxide, preferably a fluoropolymer with perfluoroethane being the preferred fluoropolymer and the light frequency will be from about 275 to about 350 nanometers which is a range of frequencies selective to a copper ammonium complex which is formed as opposed to aqueous ammonium hydroxide.

REFERENCES:
patent: 3922551 (1975-11-01), Williams
patent: 4163899 (1979-08-01), Burough
patent: 4570069 (1986-02-01), Gager
patent: 4648396 (1987-03-01), Raemer
patent: 4707603 (1987-11-01), Miemela et al.
patent: 4785184 (1988-11-01), Bien et al.
patent: 4958076 (1990-09-01), Bonne et al.
patent: 5060508 (1991-10-01), Wong

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

On-line monitor for moisture contamination in HCL gas and copper does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with On-line monitor for moisture contamination in HCL gas and copper, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and On-line monitor for moisture contamination in HCL gas and copper will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1974839

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.