Radiant energy – Ion generation – Electron bombardment type
Reexamination Certificate
2006-02-14
2006-02-14
Lee, John R. (Department: 2881)
Radiant energy
Ion generation
Electron bombardment type
C250S42300F, C250S424000, C250S281000, C250S282000, C250S288000, C250S292000, C250S293000
Reexamination Certificate
active
06998622
ABSTRACT:
An electron impact ion source includes an ionization chamber in which a first rf multipole field can be generated and an ion guide positioned downstream from the ionization chamber in which a second rf multipole field can be generated wherein electrons are injected into the ionization chamber along the axis (on-axis) to ionize an analyte sample provided to the ionization chamber.
REFERENCES:
patent: 5763878 (1998-06-01), Franzen
patent: 5942752 (1999-08-01), Wang
patent: 6528784 (2003-03-01), Tang et al.
patent: 6627883 (2003-09-01), Wang et al.
patent: 6911650 (2005-06-01), Park
patent: 6919562 (2005-07-01), Whitehouse et al.
patent: 2004/0238755 (2004-12-01), Lee et al.
patent: 2005/0139760 (2005-06-01), Wang et al.
patent: 2005/0167584 (2005-08-01), Kernan et al.
patent: WO 2004/079765 (1999-09-01), None
Cirimele Edward C.
Wang Mingda
Lee John R.
Souw Bernard E.
LandOfFree
On-axis electron impact ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with On-axis electron impact ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and On-axis electron impact ion source will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3655735