On-axis air gage focus system

Recorders – Printing – dotting – or punching marker – Ink transfer support or moving means

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Details

73375, G01D 942, G01M 302

Patent

active

050879278

ABSTRACT:
A lithography tool having an improved focus system. The focus system comprises a lens mounted in a nosepiece which defines a chamber. The chamber defines an onifice through which the lens system may see a workpiece. An air supply is provided to supply a regulated and measured air flow to the chamber. By measuring the air flow into the chamber, the rate of air flow through the orifice may be determined. The rate of air flow through the orifice is proportional to the gap between the orifice and a workpiece.

REFERENCES:
patent: 3903735 (1975-09-01), Wilson
patent: 4142401 (1979-03-01), Wilson
patent: 4796038 (1989-01-01), Allen et al.
patent: 4801352 (1989-01-01), Piwczyk
Silicon Processing for the VLSI Era. vol. 1, Process Technology, Stanley Wolf and Richard N. Tauber, Lattice Press, 1987, pp. 493-505.

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