Offner imaging system with reduced-diameter reflectors

Details Offner imaging system with reduced-diameter reflectors Offner imaging system with reduced-diameter reflectors

2007-02-06

2007-02-06

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S071000, C378S034000, C378S035000, C250S492100

Reexamination Certificate

active

10933170

ABSTRACT:
A projection optical system for digital lithography includes an Offner imaging system with a defined optical axis. The Offner imaging system has a well-corrected region. The system includes means for shaping an optical beam having an extent too large to fit within the well-corrected region to propagate through the Offner imaging system within the well-corrected region.

REFERENCES:
patent: 3748015 (1973-07-01), Offner
patent: 5512759 (1996-04-01), Sweatt
patent: 5537385 (1996-07-01), Alon et al.
patent: 2003/0007066 (2003-01-01), Forrer et al.
patent: 2004/0218162 (2004-11-01), Whitney
patent: 2 332 533 (1999-06-01), None
patent: WO 92/02838 (1992-02-01), None

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