Offner imaging system with reduced-diameter reflectors

Details Offner imaging system with reduced-diameter reflectors Offner imaging system with reduced-diameter reflectors

2008-01-01

2008-01-01

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C378S034000

Reexamination Certificate

active

07315352

ABSTRACT:
A projection optical system for digital lithography. The system includes an Offner imaging system defining an optical axis and having a well-corrected region. The system also includes spatial light modulators circumferentially arranged about the optical axis, such that optical beams emitted thereby propagate through the Offner imaging system within the well-corrected region.

REFERENCES:
patent: 3748015 (1973-07-01), Offner
patent: 5512759 (1996-04-01), Sweatt
patent: 5537385 (1996-07-01), Alon et al.
patent: 6947199 (2005-09-01), Roxlo et al.
patent: 7130020 (2006-10-01), Whitney
patent: 2003/0007066 (2003-01-01), Forrer et al.
patent: 2 332 533 (1999-06-01), None
patent: WO92/02838 (1992-02-01), None

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