Off-axis radio frequency diode apparatus for sputter deposition

Details Off-axis radio frequency diode apparatus for sputter deposition Off-axis radio frequency diode apparatus for sputter deposition

1994-01-27

1996-01-09

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429826, 20429827, 20429828, C23C 1434

Patent

active

054826047

ABSTRACT:
A device for depositing a high quality thin film of material upon a surface is disclosed. The device is particularly adaptable to the construction of mirrors since it allows for coating of alternating layers of material. The quality of the film deposited is greatly improved by placing the substrates adjacent to the target surface and not directly in front of it. Furthermore, the substrates are rotated to improve uniformity of the coating.

REFERENCES:
patent: 4767516 (1988-08-01), Nakatsuka et al.
patent: 5328582 (1994-07-01), Cole
patent: 5328583 (1994-07-01), Kameyama et al.

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