Off-axis illuminator lens mask for photolithographic projection

Details Off-axis illuminator lens mask for photolithographic projection Off-axis illuminator lens mask for photolithographic projection

1998-06-26

1999-10-26

Lee, Eddie C.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 67, 355 69, 355 5301, 355 533, G03B 2772

Patent

active

059737670

ABSTRACT:
The present invention provides for novel off-axis illuminator lens masks for semiconductor photolithographic projection systems. The masks are rotationally symmetric along axes 60.degree. or 120.degree. apart. Such masks can increase the contrast 30.degree. and 60.degree. with respect to the X and Y axes of an integrated circuit in a semiconductor wafer for the optimum printing of conducting lines along these directions.

REFERENCES:
patent: 5114223 (1992-05-01), Torigoe et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5473412 (1995-12-01), Ozawa
patent: 5502313 (1996-03-01), Nakamura et al.
patent: 5629805 (1997-05-01), Fukuzawa
patent: 5757470 (1998-05-01), Dewa et al.

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