Odor removal apparatus and/or methods

Baths – closets – sinks – and spittoons – Ventilation – Bowl structure or vent valve

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C004S213000

Reexamination Certificate

active

06983491

ABSTRACT:
An odor removal apparatus for a toilet wherein the apparatus and toilet has a bowl, an outlet from the bowl and a barrier between the bowl and the outlet which substantially prevents odors from the outlet passing to the bowl. A gas extraction apparatus is in communication with an area in the vicinity of the bowl and the outlet whereby operation of the gas extraction apparatus substantially removes odors from the vicinity of the bowl and transfers them to the outlet. The gas extraction apparatus comprises a fan operable to induce a flow of gases and entrained odors for removal of the odors from the vicinity of a toilet. The fan is immersed in the water in the cistern of the toilet.

REFERENCES:
patent: 2297935 (1942-10-01), Baither
patent: 2985890 (1961-05-01), Baither
patent: 3524415 (1970-08-01), Heiman
patent: 3649972 (1972-03-01), Sowards
patent: 3938201 (1976-02-01), McGrew
patent: 4133060 (1979-01-01), Webb
patent: 4365361 (1982-12-01), Sanstrom
patent: 4800596 (1989-01-01), Menge
patent: 4864664 (1989-09-01), Higgins
patent: 5044018 (1991-09-01), Gandini
patent: 5257421 (1993-11-01), Rose
patent: 6370703 (2002-04-01), Kim et al.
patent: 2 096 662 (1982-10-01), None
patent: 2 184 140 (1987-06-01), None
patent: 2 347 691 (2000-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Odor removal apparatus and/or methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Odor removal apparatus and/or methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Odor removal apparatus and/or methods will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3583666

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.