Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-01-15
1989-08-01
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430193, 430326, 534556, 534557, G03C 154, G03C 160, C07C11300
Patent
active
048533157
ABSTRACT:
Esters of 1-oxo-2-diazo-naphthalene sulfonic acid wherein the sulfonic acid group is at either the 4 or the 5 position of a hydroxymethyl-tricyclo [5.2.1.0.sup.2,6 ] decane wherein the hydroxy group is either at the 3 or 4 position and useful as sensitizers for positive resists, particularly relatively thick resists at 365 nm.
REFERENCES:
patent: 2767092 (1956-10-01), Schmidt
patent: 3050389 (1962-08-01), Sus
patent: 3061430 (1962-10-01), Uhlig et al.
patent: 3640992 (1972-02-01), Sus et al.
patent: 4397937 (1983-08-01), Clecak et al.
McKean Dennis R.
Miller Robert D.
Walsh Joseph G.
Willson Carlton G.
Bowers Jr. Charles L.
International Business Machines - Corporation
Leal Peter R.
Stemwedel John A.
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