Nozzle system for feeding treatment liquid such as a liquid deve

Details Nozzle system for feeding treatment liquid such as a liquid deve Nozzle system for feeding treatment liquid such as a liquid deve

1998-05-15

2000-03-28

Beck, Shrive

Coating apparatus

Projection or spray type

Rotating work

118 52, 427240, 427425, 222504, 222559, B05D 102, B65D 4700, B67D 300

Patent

active

060426470

ABSTRACT:
In a nozzle system for feeding treatment liquid, a storage tank is equipped with a nozzle comprising an opening and a stopcock which opens and closes said opening. When the stopcock opens the opening, a predetermined amount of liquid developer is dropped from the tank onto a wafer through a narrow gap between the outer surface of the stopcock and the inner edge of the opening. Thereby, the large amount of the liquid developer can be discharged and diffused on the entire wafer surface for a short time. Besides, the liquid amount is controlled with ease, and damage to the wafer is reduced, which enables a high quality of the development.

REFERENCES:
patent: 4579255 (1986-04-01), Frates et al.
patent: 5405443 (1995-04-01), Akimoto et al.
patent: 5562772 (1996-10-01), Neoh
patent: 5747102 (1998-05-01), Smith et al.
Gangel, Tetrafluorethylene-Perfluorovinyl Ether Copolymers, Kirk-Othmer Encyclopedia of Chemical Technology (4th Edition), pp. 671-683, 1994.

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