Surgery – Means for introducing or removing material from body for... – Treating material introduced into or removed from body...
Reexamination Certificate
2006-06-20
2006-06-20
Rodriguez, Cris (Department: 3763)
Surgery
Means for introducing or removing material from body for...
Treating material introduced into or removed from body...
C239S461000, C239S469000, C239S470000, C239S483000, C222S566000, C128S200180, C128S200140
Reexamination Certificate
active
07063686
ABSTRACT:
A nozzle having an ejection duct structured so as to allow a better distribution of the substances on the inner panes of nasal cavities and similar, such as auricular, vaginal and rectal cavities is described. A conical central portion is mounted in the nozzle outlet portion with its base in the outlet opening providing an annular fluid outlet, the conical central portion is rigidly secured to the inner wall of the outlet portion with baffles. In different embodiments of the invention the outlet portion, the central portion, the baffles and the annular outlet opening vary in shape.
REFERENCES:
patent: 2141077 (1938-12-01), Baker
patent: 3062456 (1962-11-01), Thompson et al.
patent: 5046877 (1991-09-01), Longo
patent: 5067655 (1991-11-01), Farago et al.
patent: 5533501 (1996-07-01), Denyer
patent: 5685869 (1997-11-01), Py
patent: 6228070 (2001-05-01), Mezzoli
patent: 6354519 (2002-03-01), Kidooka et al.
patent: 6394366 (2002-05-01), Adams
patent: 6478196 (2002-11-01), Fuchs
patent: 960 777 (1957-03-01), None
patent: WO 96/29044 (1996-09-01), None
Abelman ,Frayne & Schwab
Rodriguez Cris
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