Nozzle device, film forming apparatus and method using the...

Details Nozzle device, film forming apparatus and method using the... Nozzle device, film forming apparatus and method using the...

2005-03-21

2009-02-10

Tadesse, Yewebdar T (Department: 1792)

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to attribute, absence or presence of work

C118S686000, C118S308000, C118S309000, C118S319000, C118S321000, C118S323000

Reexamination Certificate

active

07488389

ABSTRACT:
A film forming apparatus by which uniform and large area films can be formed according to the AD method. The film forming apparatus includes: a film forming chamber; a substrate holder located in the film forming chamber, for holding a substrate on which a structure is to be formed; an exhaust pump for exhausting an interior of the film forming chamber; an aerosol generating unit for generating an aerosol by blowing up a raw material powder placed in a container with a gas; a carrier pipe for introducing the generated aerosol into the film forming chamber; a nozzle for spraying the aerosol introduced via the carrier pipe toward the substrate; and a control unit for chaotically changing a relative position of the substrate held by the substrate holder and the nozzle.

REFERENCES:
patent: 6349668 (2002-02-01), Sun et al.
patent: 6660332 (2003-12-01), Kawase et al.
patent: 2005/0098103 (2005-05-01), Miyoshi
patent: 1231294 (2002-08-01), None
patent: 07-031575 (1995-02-01), None
patent: 2001348659 (2001-12-01), None
patent: 2004-000654 (2004-01-01), None
English Translated Detailed Description of JP 2001348659A.

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