Nozzle-based, vapor-phase, plume delivery structure for use...

Electric resistance heating devices – Heating devices – Vaporizer

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C392S388000

Reexamination Certificate

active

08059945

ABSTRACT:
A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible.

REFERENCES:
patent: 3328017 (1967-06-01), Conner
patent: 3345059 (1967-10-01), Swindt
patent: 3884688 (1975-05-01), Schottmiller et al.
patent: 4318938 (1982-03-01), Barnett et al.
patent: 4325986 (1982-04-01), Baron et al.
patent: 4392451 (1983-07-01), Mickelson et al.
patent: 4401052 (1983-08-01), Baron et al.
patent: RE31968 (1985-08-01), Mickelsen et al.
patent: 4812326 (1989-03-01), Tsukazaki et al.
patent: 4844719 (1989-07-01), Toyomoto et al.
patent: 5031229 (1991-07-01), Chow
patent: 5053355 (1991-10-01), Von Campe
patent: 5149375 (1992-09-01), Matsuyama
patent: 5158750 (1992-10-01), Finicle
patent: 5216742 (1993-06-01), Krug et al.
patent: 5239611 (1993-08-01), Weinert
patent: 5445973 (1995-08-01), Hedstrom
patent: 5571749 (1996-11-01), Matsuda et al.
patent: 5741547 (1998-04-01), Akram et al.
patent: 5803976 (1998-09-01), Baxter et al.
patent: 5820681 (1998-10-01), Colombo et al.
patent: 6074487 (2000-06-01), Yoshioka et al.
patent: 6092669 (2000-07-01), Kushiya et al.
patent: 6310281 (2001-10-01), Wendt et al.
patent: 6372538 (2002-04-01), Wendt et al.
patent: 7194197 (2007-03-01), Wendt et al.
Non-Final Office action dated Jul. 21, 2010 for U.S. Appl. No. 12/154,550.
U.S. Appl. No. 11/725,975, filed Mar. 19, 2007, Wendt et al.
U.S. Appl. No. 12/154,548, filed May 22, 2008, Wendt et al.
U.S. Appl. No. 12/154,549, filed May 22, 2008, Wendt et al.
U.S. Appl. No. 12/154,550, filed May 22, 2008, Wendt et al.
U.S. Appl. No. 09/613,950, filed Jul. 11, 2000, Wendt et al.
U.S. Appl. No. 09/614,532, filed Jul. 11, 2000, Wendt et al.
U.S. Appl. No. 09/614,539, filed Jul. 11, 2000, Wendt et al.
T.W.F. Russell,Technology Development Versus New Ideas Development by Universities, The American Institute of Physics, pp. 93-99 (1997).
S.C. Jackson et al.,A Chemical Reaction Model for Physical Vapor Deposition of Compound Semiconductor Films, AIChE Journal, vol. 33, No. 5, pp. 711-721 (May 1987).
S.C. Jackson et al.,Molecular Beam Distributions from High Rate Sources, J. Vac. Sci. Technol., American Vacuum Society, pp. 1916-1920 (Oct. 1985).
T.W.F. Russell et al.,Properties of Continuously-Deposited Photovotaic-Grade CdS, 16thIEEE Photovoltaic Specialists Conference, San Diego, CA, pp. 1-8 (Sep. 28-Oct. 1, 1982).
R. E. Rocheleau et al.,Continuous Deposition of Photovoltaic-Grade CdS Sheet at the Unit Operations Scale, 4thEuropean Communities PVSEC, Stresa, Italy (May 10-14, 1982), pp. 1-7.
R. E. Rocheleau et al.,Analysis of Evaporation of Cadmium Sulfide for Manufacture of Solar Cells, AIChE Journal, vol. 28, No. 4 (Jul. 1982).
J. A. Giordmaine et al.,Molecular Beam Formation by Long Parallel Tubes, Journal of Applied Physics, vol. 31, No. 3 (Mar. 1960).
Gordon P. Brown et al.,The Flow of Gases in Pipes at Low Pressures, Journal of Applied Physics, vol. 17, pp. 802-813 (Oct. 1946).
R.M. Birkmire, Recent Progress and Critical Issues in Thin Film Polycrystalline Solar Cells and Modules, Internet, 99. 1-6, (1997).
Non-final Office Action dated Jan. 4, 2001 for U.S. Pat. No. 6,310,281.
Non-final Office Action dated Mar. 23, 2001 for U.S. Pat. No. 6,372,538.
Non-final Office Action dated Feb. 4, 2002 for U.S. Appl. No. 09/613,950.
Final Office Action dated Nov. 4, 2002 for U.S. Appl. No. 09/613,950.
Non-final Office Action dated Dec. 19, 2001 for U.S. Appl. No. 09/614,532.
Final Office Action dated Aug. 13, 2002for U.S. Appl. No. 09/614,532.
Non-final Office Action dated Aug. 6, 2002 for U.S. Appl. No. 09/614,539.
Final Office Action dated Apr. 8, 2003 for U.S. Appl. No. 09/614,539.
Non-final Offical Action dated Jan. 28, 2002 for U.S. Pat. No. 7,194,197.
Final Office Action dated Nov. 8, 2002 for U.S. Pat. No. 7,194,197.
Non-final Office Action dated Dec. 12, 2003 for U.S. Pat. No. 7,194,197.
Non-final Office Action dated Sep. 21, 2004 for U.S. Pat. No. 7,194,197.
Final Office Action dated Aug. 26, 2005 for U.S. Pat. No. 7,194,197.
Non-final Office Action dated Feb. 7, 2007 for U.S. Pat. No. 7,194,197.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Nozzle-based, vapor-phase, plume delivery structure for use... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Nozzle-based, vapor-phase, plume delivery structure for use..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Nozzle-based, vapor-phase, plume delivery structure for use... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4311885

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.