NOx control

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier

Reexamination Certificate

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Details

C422S168000

Reexamination Certificate

active

06887438

ABSTRACT:
A NOxcontrol for an exhaust is provided. The NOxcontrol includes a nickel compound and a NOxadsorber. Systems for treating an exhaust gas are also provided, including use of a non-thermal plasma reactor and a NOxcontrol, and optionally a particulate trap.

REFERENCES:
patent: 3701822 (1972-10-01), Negra et al.
patent: 4003976 (1977-01-01), Komatsu et al.
patent: 5130109 (1992-07-01), Wan
patent: 5362463 (1994-11-01), Stiles et al.
patent: 5804152 (1998-09-01), Miyoshi et al.
patent: 6022825 (2000-02-01), Andersen et al.
patent: 6308671 (2001-10-01), Reed et al.
patent: 6365118 (2002-04-01), Kharas et al.
patent: 6391822 (2002-05-01), Dou et al.
patent: 6407032 (2002-06-01), Labarge et al.
patent: 6455463 (2002-09-01), Labarge et al.
patent: 6464945 (2002-10-01), Hemingway
patent: 6489259 (2002-12-01), LaBarge et al.
patent: 6497092 (2002-12-01), Theis
patent: 6576578 (2003-06-01), Ikuta et al.
patent: 6592833 (2003-07-01), Kharas
patent: 6624113 (2003-09-01), Labarge et al.
patent: 20030086851 (2003-05-01), Dou
patent: 0625633 (1994-11-01), None
patent: 0664147 (1995-07-01), None
patent: 0878610 (1998-11-01), None
patent: 0905354 (1999-03-01), None
patent: 0931590 (1999-07-01), None
patent: 0953375 (1999-11-01), None
patent: 0043102 (2000-07-01), None
European Search Report for EP 01 20 4810.

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