Novolak resins and their use in radiation-sensitive compositions

Details Novolak resins and their use in radiation-sensitive compositions Novolak resins and their use in radiation-sensitive compositions

1992-12-07

1994-09-13

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 430270, 528129, 528153, 528155, G03F 7023, G03F 730

Patent

active

053467990

ABSTRACT:
An alkali-soluble novolak binder resin made by the condensation reaction of a mixture of phenolic monomers with at least one aldehyde source, said phenolic monomers consisting of:
(1) about 2-18% by weight of said mixture being 2,6-dimethylphenol;
(2) about 55-75% by weight of said mixture being 2,3-dimethylphenol;
(3) about 16-40% by weight of said mixture being a para-substituted lower alkyl phenol selected from the group consisting of 3,4-dimethylphenol, para-cresol, and para-cresol dimer;
and the amount of said aldehyde source being at least a stoichiometric amount to react with all of said phenolic moieties. These novolak binder resins may be used in radiation-sensitive compositions useful as positive-working photoresists.

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