Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2006-06-13
2006-06-13
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S191000, C430S192000, C430S193000
Reexamination Certificate
active
07060410
ABSTRACT:
There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a novolak resin solution produced by dissolving a novolak resin in an organic solvent; a positive photoresist composition comprising the novolak resin solution and a photosensitive component; a positive photoresist composition comprising the novolak resin solution, a photosensitive component, and hydroquinone; and a method of producing a positive photoresist composition involving mixing the novolak resin solution described above and a photosensitive component.
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JP-10232489 English Abstract.
JP-07-248619 English Abstract.
Doi Kousuke
Nakagawa Yusuke
Ohnishi Hiroyuki
Chu John S.
Hoffmann & Baron , LLP
Tokyo Ohka Kogyo Co. Ltd.
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