Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Patent
1992-09-28
1994-12-06
Kight, III, John
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
528129, 525480, 525491, 525501, C08G 1404
Patent
active
053711696
ABSTRACT:
The present invention provides mixture of at least two novolak resins with a molecular weight distribution overlap of at least 50% and having dissolution rates which differ by a factor of at least 2.0. A method is also provided for producing such novolak resin mixtures.
REFERENCES:
patent: 3666473 (1972-05-01), Colom et al.
patent: 4551409 (1985-11-01), Gulla et al.
patent: 4797346 (1989-01-01), Yamamoto et al.
patent: 4988601 (1991-01-01), Ushirogouchi et al.
Patent Abstracts of Japan, vol. 10, No. 291 (M-522) Oct. 3, 1986 & JP-A-61,106,297 (Konishiro Photo Ind. Co. Ltd.) May 24, 1986.
IBM Technical Disclosure Bulletin, vol. 25, No. 8, Jan. 1983, New York, US, pp. 4401-4403, L. P. Bushnell et al "Mixed-resin Photoresist System for Mid & Deel Ultraviolet".
Derwent Publications Ltd., London, GB; AN 7753080Y & JP-A-52,071,224 (Okyo Shibaura Elec. Ltd.) Jun. 14, 1977.
Canize Anthony
Khanna Dinesh N.
Lu Ping H.
Rahman M. Dalil
Hoechst Celanese Corporation
Jones Richard
Kight III John
Sayko Jr. Andrew F.
LandOfFree
Novolak resin mixtures does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Novolak resin mixtures, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Novolak resin mixtures will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-215307