Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Patent
1987-11-09
1989-03-14
Foelak, Morton
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
528153, 528155, 528493, 430165, 430189, 430192, 430193, 430270, 430313, 430319, C08G 804
Patent
active
048125512
ABSTRACT:
A novolak resin for a positive photoresist is provided herein, which resin is produced by the addition condensation reaction of a phenol with formaldehyde. This novolak resin has improved heat resistant and sensitivity properties and the thickness retention of the novolak resins are very high. The novolak resins are characterized in that the area ratio of the gel permeation chromatographic pattern (GPC) as measured by the use of a UV(254 nm) detector, is as follows: a range wherein the molecular weight, calculated as polystyrene, is from 150 to less than 500, not including a phenol and the unreacted monomer, is from 8 to 35%, hereinafter referred to as an A region, the range wherein the molecular weight calculated as polystyrene is from 500 to less than 5000 is from 0 to 30%, hereinafter referred to as a B region, and the range wherein the molecular weight calculated as polystyrene exceeds 5000 is from 35 to 92%, hereinafter referred to as the C region, and wherein the ratio of the B region to the A region is 2.50 or less.
REFERENCES:
patent: 4173470 (1979-11-01), Fahrgnholtz et al.
patent: 4719167 (1988-01-01), Miura et al.
Furuta Akihiro
Hanabata Makoto
Ninomiya Takao
Oi Fumio
Osaki Haruyoshi
Acquah S. A.
Foelak Morton
Sumitomo Chemical Company Limited
LandOfFree
Novolak resin for positive photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Novolak resin for positive photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Novolak resin for positive photoresist will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-894522