Novolak resin blends for photoresist applications

Details Novolak resin blends for photoresist applications Novolak resin blends for photoresist applications

1992-12-29

1994-12-20

Kight, III, John

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

430192, C08G 828

Patent

active

053746937

ABSTRACT:
The present invention relates to a water insoluble. aqueous alkali soluble novolak resin blend, wherein the resin blend comprises two novolaks having dissimilar relative molecular weights and similar dissolution rates, a process for producing such a resin blend, a photoresist containing such a resin blend and a method for producing a semi-conductor device utilizing such a photoresist.

REFERENCES:
patent: 3666473 (1972-05-01), Colom et al.
patent: 4551409 (1985-11-01), Gulla et al.
patent: 4731319 (1988-03-01), Kohara et al.
patent: 4797346 (1989-10-01), Yamamoto et al.

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