Novolak photoresist composition and preparation thereof

Details Novolak photoresist composition and preparation thereof Novolak photoresist composition and preparation thereof

1977-11-09

1979-11-06

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

528125, 528493, 528155, 430319, 430306, 430313, 430165, 430189, 430270, G03C 168, G03C 500, G03C 152, A47G 2704

Patent

active

041734700

ABSTRACT:
A novolak resin suitable for use as a light-sensitive photoresist or maskant is prepared by reaction of at least one cresol with an aldehyde or reactive ketone and an aromatic hydroxyl compound having an alkyl side chain of from 3-15 carbon atoms. The addition of a conventional photosensitive agent yields a composition evidencing superior characteristics as compared with prior art novolak photoresists and which requires less sensitizer than such prior art resists.

REFERENCES:
patent: 3687896 (1972-08-01), Vargiu et al.
patent: 3827908 (1974-08-01), Johnston et al.
patent: 3868254 (1975-02-01), Wemmers
patent: 4115128 (1978-09-01), Kita
Kice and Marvell, Modern Principles of Organic Chemistry, The MacMillan Co., N.Y. C1965, pp. 306-307.

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