Novolac polymer planarization films for microelectronic structur

Details Novolac polymer planarization films for microelectronic structur Novolac polymer planarization films for microelectronic structur

1994-07-06

1999-01-12

Cain, Edward J.

Stock material or miscellaneous articles

Composite

Of silicon containing

B32B 1312

Patent

active

058585478

ABSTRACT:
An improved method for forming planarization films which remain adhered to substrates upon exposure to heat comprising first applying a polymeric solution containing a low molecular weight novolac resin, a surfactant selected from the group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.

REFERENCES:
patent: 3947393 (1976-03-01), Sato et al.
patent: 4167500 (1979-09-01), Jazenski et al.
patent: 4427713 (1984-01-01), White et al.
patent: 4511430 (1985-04-01), Chen et al.
patent: 4515828 (1985-05-01), Economy et al.
patent: 4520041 (1985-05-01), Aoyama et al.
patent: 4532005 (1985-07-01), Grieco et al.
patent: 4604162 (1986-08-01), Sobezak
patent: 4619837 (1986-10-01), Brown
patent: 4621042 (1986-11-01), Pampalone et al.
patent: 4621045 (1986-11-01), Goodner
patent: 4701390 (1987-10-01), Grunwald et al.
patent: 4762768 (1988-08-01), Grunwald et al.
patent: 4904516 (1990-02-01), Creamer
patent: 5178988 (1993-01-01), Leech et al.
patent: 5276126 (1994-01-01), Rogler
Stanley Wolf and Richard N. Tauber, "Silicon Processing for The VLSI Era", vol. 1, pp. 418-420, (1986).
L.K. White, "Planarization Properties of Resist and Polyimide Coatings", vol. 130(7), pp. 1543-1548, Journal of the Electrochemical Society, Jul. 1983.
I.E. Stillwagon and G.N. Taylor, "Evaluation of Several Organic Materials as Planarizing Layers for Lithographic and Etchback Processing" Polymers in Microlithography, ACS Symp, Series vol. 412, pp. 252-265, (1989).
FR 2392495 . . . (English Abstract) (Jan. 26, 1979).
DD 294372 (English Abstract) (Sep. 26, 1991).

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