Novel susceptor for use in chemical vapor deposition apparatus a

Details Novel susceptor for use in chemical vapor deposition apparatus a Novel susceptor for use in chemical vapor deposition apparatus a

1990-03-05

1992-02-25

Bueker, Richard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 451, 427 46, 118723, 118725, 118500, C23C 1600

Patent

active

050912089

ABSTRACT:
A composite susceptor for forming uniform deposits by chemical vapor deposition. The composite susceptor has an electrically conducted layer of material disposed on a block of material which is adapted to be heated by an induction heating coil. The conductive layer is electrically biased to control the geometry of the gas plasma. By electrically controlling the geometry of the gas plasma, more uniform deposition of a material on a substance is achieved. A composite susceptor having a segmented conductive layer for producing a graded electrical profile and a conductive ring surrounding a gas plasma are also described. In one aspect, a phase-shifting layer of material is disposed on the conductive layer.

REFERENCES:
patent: 4499354 (1985-02-01), Hill et al.
patent: 4767517 (1988-08-01), Hiraki et al.
patent: 4767608 (1988-08-01), Matsumoto et al.
"Emerging Technology of Diamond Thin Films", Peter K. Bachman and Russell Messier, Chemical & Engineering News, May 15, 1989, pp. 24-39.

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