Novel stripping composition for positive photoresists and method

Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 3, 134 38, 134 42, 1566591, 1566611, 156904, 252171, 252549, 252558, 252DIG8, 430315, B08B 308, C09D 900, C09D 904, C23D 1700

Patent

active

043046819

ABSTRACT:
A novel stripping composition and method of using same is disclosed, which stripping composition comprises:

REFERENCES:
patent: 3813309 (1974-05-01), Bakus et al.
patent: 4165294 (1979-08-01), Vandermey
patent: 4165295 (1979-08-01), Vandermey

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Novel stripping composition for positive photoresists and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Novel stripping composition for positive photoresists and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Novel stripping composition for positive photoresists and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-566994

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.