Novel resist spinning head

Details Novel resist spinning head Novel resist spinning head

1977-06-30

1978-05-02

Kaplan, Morris

Coating apparatus

With means to centrifuge work

118503, B05C 1108

Patent

active

040868702

ABSTRACT:
A resist spinning head for preventing photoresist, or electron and X-ray resist from flowing to the edge of the wafer when spin coating in a photoresist spinner, which includes the use of a tapered top plate having a knife-edge contact to the surface of the wafer so as to seal the top of the wafer at an outer ring and prevent resist from flowing under the top plate; whereby the resist is guided, during spinning, by the tapered top surface to the edge of the plate and off the head. The tapered top plate is pressed against the wafer and secured by a spring biasing means to a spinner motor shaft.

REFERENCES:
patent: 2021485 (1935-11-01), Huebner
patent: 3906890 (1975-09-01), Amos et al.

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