Compositions – Fluent dielectric – N-containing
Patent
1983-08-16
1989-04-04
Albrecht, Dennis
Compositions
Fluent dielectric
N-containing
252153, 252DIG5, 252DIG13, 260404, 424 70, 514563, 514844, 514847, 514881, 562567, A61K 750, C07C10350, C11D 110, C11D 1708
Patent
active
048184403
ABSTRACT:
Novel surfactant compounds are provided of the formula R--CO--NH--(C.sub.2 H.sub.4 O).sub.n --CH.sub.2 COOH, wherein R--CO-- is the residue of at least one aliphatic carboxylic acid of 6-22 carbon atoms and n represents a number having an average of 2-10, as well as their salts with alkali metals, ammonium and amines. These compounds possess not only a low primary toxicity, but also a low secondary toxicity for the skin, and accordingly they are especially useful in cosmetic compositions, compositions for non-automatic dishwashing and laundering compositions for the fine laundry.
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McCutcheon's Detergents & Emulsifiers-1978 North American Edition, published by MC Publishing Co., 175 Rock Rd., Glen Rock, N.J. 07452, pp. 168, 179, 227 and 239.
AKPO surfactant bulletin published by CHEM-Y, Bodegraven, Holland, 4 pp. (publication date uncertain).
Aalbers Johan G.
Schafer Doris
Schafer Rolf
Schafer Werner
Smid Jacob K.
Albrecht Dennis
Stamicarbon B.V.
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