Novel organometallic polymers

Details Novel organometallic polymers Novel organometallic polymers

1987-01-08

1988-03-29

Phynes, Lucille M.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

522148, 522166, 528 13, 528 25, 528230, 528245, 528270, C08G 7700

Patent

active

047344814

ABSTRACT:
Homopolymers or copolymers of organometallic, end-capped polyphthalaldehydes containing the repeating unit of formula I ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are each independently of the other hydrogen, halogen, cyano, nitro, carboxyl, hydroxyl, C.sub.1 -C.sub.4 alkoxy, C.sub.1 -C.sub.4 alkylthio or C.sub.1 -C.sub.4 alkoxycarbonyl, and at least one of the substituents R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are a group --Q(R.sup.5).sub.3 or --Q(R.sup.6).sub.3, where Q is Si, Sn, Ge, CH.sub.2 --Si or O--Si, R.sup.5 is C.sub.1 -C.sub.12 alkyl and R.sup.6 is C.sub.6 -C.sub.10 aryl, are suitable for producing dry-developed, plasma-resistant photoresists required for the production of structured images, especially for microelectronics.

REFERENCES:
patent: 3609123 (1971-09-01), Rabilloud et al.
patent: 3867142 (1975-02-01), Krause
patent: 4075175 (1978-02-01), Foss
patent: 4108839 (1978-08-01), Chambers et al.
patent: 4504646 (1985-03-01), Nate et al.

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