Organic compounds -- part of the class 532-570 series – Organic compounds – Oxygen containing
Patent
1982-03-24
1983-11-29
Lone, Werren B.
Organic compounds -- part of the class 532-570 series
Organic compounds
Oxygen containing
C07C 3914
Patent
active
044182201
ABSTRACT:
Indene compounds of the formula ##STR1## wherein X represents a hydrogen atom, a halogen atom, a hydroxyl group or a methyl group, and y is 0 or an integer of 1 to 3, are produced by either heat-decomposing indene compounds of the formula ##STR2## wherein X and y are as defined, in the presence of an acid or alkaline catalyst; or heat-decomposing isopropenyl phenols of the formula ##STR3## wherein X and y are as defined, or oligomers or polymers thereof in the presence of an acid catalyst. 5-Hydroxy-1,1,3-trimethyl-2-indene corresponding to formula (III) is a novel compound.
REFERENCES:
patent: 1754052 (1930-04-01), Rosenthal
patent: 2969343 (1961-01-01), Morris
patent: 2970534 (1961-04-01), Petropoulos et al.
patent: 3264358 (1966-08-01), Webb et al.
patent: 3271463 (1966-09-01), Howard
patent: 3281478 (1966-10-01), Farnham
patent: 3904617 (1975-09-01), Pelz et al.
patent: 3954889 (1976-03-01), Klein et al.
patent: 4045499 (1977-08-01), Klein et al.
patent: 4334106 (1982-06-01), Dai
Kamagami "Chemical Abstract", vol. 89, pp. 146656c.
Corson et al., J. Org. Chem., vol. 23, p.544-549, (1958).
Mimaki et al., Chem. Abst., vol. 83, #96727e, (1975).
Verkhovskaya et al., Chem. Abst., vol. 83, #88316q.
Nakatani Kiyoshi
Numata Satoshi
Yamazaki Noboro
Yuasa Teruo
Lone Werren B.
Mitsui Toatsu Chemicals Inc.
LandOfFree
Novel indene compound and novel process for producing indene com does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Novel indene compound and novel process for producing indene com, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Novel indene compound and novel process for producing indene com will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-608607