Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1978-06-30
1981-02-17
Talbert, Jr., Dennis E.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
430 72, 430 58, 260174, G03G 506
Patent
active
042516145
ABSTRACT:
The present invention provides disazo compounds expressed by the general formula: ##STR1## [wherein A represents a member selected from the group consisting of ##STR2## (wherein X represents a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc., hetero rings such as indole ring, carbazole ring, benzofuran ring, etc. and their substituents, Ar.sub.1 represents a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc., hetero rings such as dibenzofuran ring, etc. and their substituents, Ar.sub.2 and Ar.sub.3 represent a member selected from the group consisting of aromatic rings such as benzene ring, naphthalene ring, etc. and their substituents, R.sub.1 and R.sub.3 represent a member selected from the group consisting of hydrogen, lower alkyl radical or phenyl radical and their substituents and R.sub.2 represents a member selected from the group consisting of lower alkyl radical, carboxyl radical and their esters)]; a process for the preparation of said compounds; and electrophotographic sensitive materials having a high sensitivity as well as a high flexibility which comprise a conductive support and a photosensitive layer formed thereon, said photosensitive layer containing said disazo compound as an effective ingredient.
REFERENCES:
patent: 3775105 (1973-11-01), Kukla
patent: 3837851 (1974-09-01), Shattuck et al.
patent: 3871882 (1975-03-01), Wiedemann
patent: 3977870 (1976-08-01), Rochlitz
patent: 4018607 (1977-04-01), Contois
patent: 4026704 (1977-05-01), Rochlitz
Schlosser, "A New Double-Layer System and Its Photoconductive Mechanism", J.A.P.E., vol. 4, #3, 1978, pp. 118-122.
Hashimoto Mitsuru
Ohta Masafumi
Sakai Kiyoshi
Sasaki Masaomi
Tsutsui Kyoji
Goodrow John L.
Ricoh & Company, Ltd.
Talbert, Jr. Dennis E.
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