Notch position aligning apparatus and process for using the appa

Metal working – Barrier layer or semiconductor device making

Patent

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Details

437925, 414936, 414938, 414433, 414757, 414786, 269289MR, 269903, B23B 522, B65G 4724

Patent

active

055332439

ABSTRACT:
According to this invention, there is provided a notch position aligning mechanism and a process for using the mechanism including a base which can be vertically movably inserted into a cassette through a lower opening of the cassette for storing a plurality of targets to be aligned having notches formed in edge portions of the targets wherein can be fitted, a rotating/supporting mechanism, including a first rotary member which is arranged on the base, and has a plurality of fitting grooves in which the notches of the targets can be fitted, a second rotary member which can be rotated and is arranged on the base, and a drive unit for rotating at least one of the first and second rotary members, the rotating/supporting mechanism supporting and rotating the targets using the first and second rotary members while the targets are spaced apart from the cassette, and a support member, arranged on the base, for supporting the targets having the notches fitted in the fitting grooves of the first rotary member to stop rotations of the targets.

REFERENCES:
patent: 4570058 (1986-02-01), Hauassy
patent: 4662811 (1987-05-01), Hayden
patent: 4778382 (1988-10-01), Sakashita
patent: 4813840 (1989-03-01), Prabhakar et al.
patent: 4970772 (1990-11-01), Steere, III
patent: 5183378 (1993-02-01), Asano et al.
patent: 5205028 (1993-04-01), Leonard
patent: 5383759 (1995-01-01), Lin

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