Static information storage and retrieval – Floating gate – Particular biasing
Patent
1990-12-03
1993-11-02
LaRoche, Eugene R.
Static information storage and retrieval
Floating gate
Particular biasing
36518901, G11C 1300
Patent
active
052589498
ABSTRACT:
Programming speed of a nonvolatile memory is improved by enhancing carrier generation. In one form, a nonvolatile memory has a control gate which overlies a channel region in a substrate. A floating gate overlies a portion of the channel region and is positioned between the substrate and the control gate. A source and a drain are formed in the substrate, being displaced by the channel region. A first programming voltage is applied to the drain to create an electric field at a junction between the drain and channel region. Current is forced into the source and through the substrate in order to enhance carrier generation at the junction between the drain and channel region, thereby increasing an electric field at the junction. A second programming voltage, having a ramp shaped leading edge, is applied to the control gate to increase the electrical field and to program the memory to a predetermined logic state.
REFERENCES:
patent: 4434478 (1984-02-01), Cook
patent: 4794565 (1988-12-01), Wu et al.
patent: 4804637 (1989-02-01), Smayling et al.
patent: 4813018 (1989-03-01), Kobayashi et al.
patent: 5022009 (1991-06-01), Terada
patent: 5042009 (1991-08-01), Kazerounian
patent: 5047981 (1991-09-01), Gill
patent: 5111427 (1992-05-01), Kobayashi
Chang Ko-Min
Chang Ming-Bing
Goddard Patricia S.
LaRoche Eugene R.
Motorola Inc.
Zarabian A.
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