Nonvolatile memory element, nonvolatile memory apparatus,...

Active solid-state devices (e.g. – transistors – solid-state diode – Semiconductor is an oxide of a metal or copper sulfide

Reexamination Certificate

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Details

C257S005000, C257S044000, C257S310000, C257SE45003, C257SE21459, C438S104000, C356S148000

Reexamination Certificate

active

07919774

ABSTRACT:
A lower electrode layer2, an upper electrode layer4formed above the lower electrode layer2, and a metal oxide thin film layer3formed between the lower electrode layer2and the upper electrode layer4are provided. The metal oxide thin film layer3includes a first region3awhose value of resistance increases or decreases by an electric pulse that is applied between the lower electrode layer2and the upper electrode layer4and a second region3barranged around the first region3aand having a larger content of oxygen than the first region3a, wherein the lower and upper electrode layers2and4and at least a part of the first region3aare arranged so as to overlap as viewed from the direction of the thickness of the first region3a.

REFERENCES:
patent: 6849891 (2005-02-01), Hsu et al.
patent: 2005/0270821 (2005-12-01), Nakano
patent: 2006/0108625 (2006-05-01), Lee et al.
patent: 2009/0097300 (2009-04-01), Ishihara et al.
patent: 2003-068984 (2003-03-01), None
patent: 2004-349690 (2004-12-01), None
patent: 2004-363604 (2004-12-01), None
patent: 2005-175457 (2005-06-01), None
patent: 2005-317976 (2005-11-01), None
patent: 2005-353662 (2005-12-01), None

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