Nonreflecting photoresist process

Details Nonreflecting photoresist process Nonreflecting photoresist process

1977-02-10

1978-07-25

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 27R, 96 84R, 96 84M, 350164, G03C 500

Patent

active

041026837

ABSTRACT:
A light absorbing medium is interposed between a photosensitive layer, such as a photoresist layer, and the surface upon which the photosensitive layer is to be applied in order to eliminate surface effects which result from the reflection of light which passes through the photosensitive layer and is then reflected upward from the surface back into the photosensitive layer. The light absorbing medium may be either a quarter-wave plate or a filter chosen to absorb light of the energy spectrum to which the photosensitive layer is sensitive.

REFERENCES:
patent: 2902365 (1959-09-01), Martin
patent: 3958042 (1976-05-01), Katsube et al.
Perveev et al., Sov. J. Opt. Technol., vol. 41, #8 Aug. 1974, pp. 453-454, Rm. 4-8-32.

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