Nondestructive analysis of multilayer roughness correlation

Details Nondestructive analysis of multilayer roughness correlation Nondestructive analysis of multilayer roughness correlation

1979-12-26

1985-10-22

Rosenberger, R. A.

Optics: measuring and testing

Of light reflection

With diffusion

356352, G01N 2148

Patent

active

045485062

ABSTRACT:
A method of evaluating the cross-correlation properties of microroughness present at the interfaces in dielectric stacks is based on a comparison between observed and calculated angular distribution of scattered light. The calculation is based on a first-order perturbation treatment of the interaction of a monochromatic plane wave with a dielectric stack which has microroughness present at each interface. The average deviation of the interface microroughness from the perfectly smooth, ideal, situation is assumed to be much less than the incident wavelength. The theory retains the vector nature of the electromagnetic fields, allows for complex dielectric constants, arbitrary angles of incidence, scattering and polarization. The dielectric stack may have any number of layers of arbitrary optical thickness. In practice, angular scattering data is measured for various incident angles with either p- or s-polarized light. These data are then compared to the calculated distribution of scattered light. By adjusting the interface cross-correlation properties of the dielectric stack model used in the calculation, a best fit between measured and observed data is obtained.

REFERENCES:
patent: 3850526 (1974-11-01), Corey
Elson et al., "Vector Scattering Theory" Optical Engineering, vol. 18, No. , (Mar.-Apr. 1979), pp. 116-124.

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