Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Distributive type parameters
Reexamination Certificate
2005-04-12
2005-04-12
Deb, Anjan (Department: 2858)
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Distributive type parameters
C324S637000
Reexamination Certificate
active
06879167
ABSTRACT:
The invention provides a noncontact measuring system for electrical conductivity, which uses a microwave. In the measuring system for electrical conductivity, the microwave generated in a network analyzer (NA)110is guided to a surface of a silicon wafer (sample)160through a waveguide130and a sensor140. The surface of the silicon wafer160is irradiated with the microwave, and the sensor140receives the reflected microwave. The electrical conductivity of the silicon wafer160is measured in such a manner that a computer (personal computer)120calculates the electrical conductivity from an amplitude ratio A and phase difference θ to a reflected wave of the silicon wafer160, which is determined with the network analyzer110. The computer120performs not only the calculation of the measurement but also whole control of the measuring system such as positioning of the sample.
REFERENCES:
patent: 4158165 (1979-06-01), Coates
patent: 4609873 (1986-09-01), Cox et al.
patent: 4893932 (1990-01-01), Knollenberg
patent: 5049816 (1991-09-01), Moslehi
patent: 5197105 (1993-03-01), Uemura et al.
patent: 5417494 (1995-05-01), Kempa et al.
patent: 5867806 (1999-02-01), Strickland et al.
patent: 6562079 (2003-05-01), Takamatsu
patent: 6674292 (2004-01-01), Bray et al.
patent: 6701783 (2004-03-01), Fehrenbach et al.
patent: 20020011852 (2002-01-01), Mandelis et al.
patent: 02072646 (1990-03-01), None
“Accurate Method for the Determination of Bulk Minority-Carrier Lifetimes of Mono-and Multicrystalline Silicon Wafers” Schmidt et al.,J. Appl. Phys., 81 (9), May 1, 1997, pp. 6186-6199.
“GaAs Wafer Mapping by Microwave-Detected Photoconductivity” Niklas et al.,Materials Science and Engineering, B80, vol. 80, No. 1-3, 2001, pp. 206-209.
“Frequency Scaling of Microwave Conductivity in the Integer Quantum Hall Effect Minima” Lewis et al.,Physical Review Bvol. 64, 2001, pp. 073310-1-073310-4.
Preliminary Program, JSNDI Spring Conference 2002, May 28-29, 2002 in Tokyo, Japan, Proceedings of the 2002 Annual Meeting of Japan Society of Mechanical Engineers/MDD, Oct. 12-114, 2002 in Tokyo, Japan.
Ju, et al. “Contactless measurement of electrical conductivity of semiconductor wafers using the reflection of millimeter waves”, Applied Physics Letters, vol. 81, No. 19, Nov. 4, 2002,.
Abe Hiroyuki
Ju Yang
Saka Masumi
Deb Anjan
Hayes & Soloway P.C.
Nguyen Hoai-An D.
Tohoku Techno Arch Co., Ltd.
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