Non-volatile resistance switching memory

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

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C257S002000, C257SE47001

Reexamination Certificate

active

07897411

ABSTRACT:
Processes, apparatus and systems for depositing a switching material that is switchable between conductivity states and where the states are persistent. The invention further relates to a microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.

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Beck et al., “Reproducible Switching Effect in Thin Oxide Films for Memory Applications,” Applied Physics Letters, AIP Jul. 3, 2000, vol. 77, No. 1, pp. 139-141.
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