Non-volatile residue system for monitoring impurities in a liqui

Details Non-volatile residue system for monitoring impurities in a liqui Non-volatile residue system for monitoring impurities in a liqui

1991-09-05

1994-01-11

McGraw, Vincent P.

Optics: measuring and testing

With sample preparation

356 37, 356335, 356336, 356337, 436 36, 422 73, G01N 110, G01N 1514

Patent

active

052786269

ABSTRACT:
A system for monitoring and analyzing impurities in a liquid by analyzing the non-volatile residue of droplets of the liquid includes a droplet generator for generating a stream of droplets of the liquid, a droplet inspection unit, a drop-on-demand unit for removing selected droplets from the stream of droplets, a heat exchanger for drying the droplets to provide non-volatile residue particles, and a particle size measurement unit. The droplet inspection unit determines the diameters of the droplets. A feedback arrangement from the droplet inspection unit controls droplet diameter by varying the droplet generation rate. The drop-on-demand unit removes a selected fraction of droplets from the droplet stream so as to reduce vapor loading in the heat exchanger and prevent agglomeration of droplets. The heat exchanger includes a first section for gradually increasing the temperature of the stream of droplets and a second section for maintaining the stream of droplets at the boiling temperature of the liquid. A vortex shedder can be used at the inlet to the heat exchanger to enhance heat transfer to the stream of droplets. The system can include an instrument for analyzing the composition of the particles.

REFERENCES:
patent: 3941479 (1976-03-01), Whitehead
patent: 5098657 (1992-04-01), Blackford et al.

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