Non-volatile memory device and a method for producing the same

Details Non-volatile memory device and a method for producing the same Non-volatile memory device and a method for producing the same

1993-11-24

1996-11-26

Fears, Terrell W.

Static information storage and retrieval

Radiant energy

Liquid crystal

365149, G11C 1304

Patent

active

055791999

ABSTRACT:
A non-volatile memory device according to the present invention includes: a substrate; a storage medium provided above the substrate; a writing unit having a heating unit provided above the substrate, for heating the storage medium by the heating unit to write data in the storage medium with a thermal change of a physical value of the storage medium; and a reading unit having an electrical reading unit provided above the substrate, for reading the change of the physical value of the storage medium as data written in the storage medium by the electrical reading unit.

REFERENCES:
patent: 3350691 (1967-10-01), Faulis et al.
patent: 3836243 (1974-09-01), Melchoir
patent: 4596445 (1986-06-01), Fergason
patent: 4662720 (1987-05-01), Fergason
patent: 4733370 (1988-03-01), Kitajima
patent: 4775226 (1988-10-01), Montgomery, Jr. et al.
patent: 5031144 (1991-07-01), Persky
Patent Abstracts of Japan, vol. 15, No. 196, (1991) and JP-A-03 046621.
Patent Abstracts of Japan, vol. 12, No. 74 (1988) and JP-A-62 212620.
T. Kakinuma et al., Japan Display '92, pp. 851-854 (1992).
P. S. Drzaic, Journal of Applied Physics, 60(6):2142-2148 (1986).
C. Bowry et al., Eurodisplay '90, pp. 158-161 (1990).

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