Non-volatile ferroelectric thin film device using an organic...

Active solid-state devices (e.g. – transistors – solid-state diode – Organic semiconductor material

Reexamination Certificate

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C257SE21255, C438S099000

Reexamination Certificate

active

07829884

ABSTRACT:
A non-volatile ferroelectric memory device is proposed which comprises a combination of an organic ferroelectric polymer with an organic ambipolar semiconductor. The devices of the present invention are compatible with—and fully exploit the benefits of polymers, i.e. solution processing, low-cost, low temperature layer deposition and compatibility with flexible substrates.

REFERENCES:
patent: 6815711 (2004-11-01), Geens et al.
patent: 6905906 (2005-06-01), Sirringhaus et al.
patent: 2003/0127676 (2003-07-01), Redecker
patent: 2005/0151176 (2005-07-01), Gudesen et al.
patent: 04180261 (1992-06-01), None
G.H. Gelinck, “High-performance all-polymer integrated circuits”, Applied Physics Letters, vol. 77, No. 10, Sep. 4, 2000, pp. 1487-1489.
F.J. Touwslager et al, “I-Line lithography of poly-(3,4-ethylenedioxythiophene) electrodes and application in all-polymer integrated circuits”, Applied Physics Letters, vol. 81, No. 24, Dec. 9, 2002, pp. 4556-4558.

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