Non vacuum soft x-ray lithographic source

Details Non vacuum soft x-ray lithographic source Non vacuum soft x-ray lithographic source

1977-07-08

1978-10-10

Church, Craig E.

Radiant energy

With charged particle beam deflection or focussing

With target means

250492R, 250493, G03B 4116

Patent

active

041198557

ABSTRACT:
A source of electrons or charged particles is contained in a baffled enclosure at less than atmospheric pressure. The source projects the electrons or charged particles to strike a target with a velocity which generates soft x-rays. The target is in a chamber at substantially atmospheric pressure in a gaseous environment which is only slightly dispersive and absorptive of the soft x-rays. Access to this chamber is provided to insert a mask and substrate for lithographing by the soft x-rays.

REFERENCES:
patent: 3602686 (1971-08-01), Lempert
patent: 3852596 (1974-12-01), Houtman
patent: 3870882 (1975-03-01), Larson

Affiliated with

Also associated with

Rating

Non vacuum soft x-ray lithographic source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Non vacuum soft x-ray lithographic source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non vacuum soft x-ray lithographic source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1768128