Non-uniform gas inlet for dry etching apparatus

Details Non-uniform gas inlet for dry etching apparatus Non-uniform gas inlet for dry etching apparatus

1987-05-11

1988-10-25

Schor, Kenneth M.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

204298, C23F 102

Patent

active

047801697

ABSTRACT:
A gas inlet having a non-uniform array of inlet holes for the non-uniform introduction of an etching gas into a reaction chamber of a dry etching apparatus. The non-uniform introduction of gas compensates for non-uniform characteristics in the dry etching apparatus resulting in a uniform etch.

REFERENCES:
patent: 4534816 (1985-08-01), Chen et al.
patent: 4585920 (1986-04-01), Hoog et al.
patent: 4595452 (1986-06-01), Landau et al.
patent: 4600464 (1986-07-01), Desilets et al.
patent: 4614639 (1986-09-01), Hegedus et al.

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