X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-10-03
2006-10-03
Ho, Allen C. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000
Reexamination Certificate
active
07116755
ABSTRACT:
A non-uniform density sample analyzing method for analyzing a distribution state of particle-like matter in a non-uniform density sample, where an actually measured X-ray scattering curve is an in-plane X-ray scattering curve obtained by in-plane diffraction measurement, and fitting between the in-plane X-ray scattering curve and the simulated X-ray scattering curve is performed. The value of the fitting parameter when the simulated X-ray scattering curve agrees with the in-plane X-ray scattering curve serves to indicate the in-plane direction distribution sate of the particle-like matter in the non-uniform density sample. This method can analyze the in-plane direction distribution state of the particle-like matter in the anisotropic non-uniform density sample easily and accurately. Its device and system are also disclosed.
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Ho Allen C.
Rigaku Corporation
Wenderoth , Lind & Ponack, L.L.P.
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