Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Reexamination Certificate
2005-02-08
2005-02-08
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
C204S164000, C204S173000, C204S174000, C422S186040
Reexamination Certificate
active
06852200
ABSTRACT:
A gas treatment system and method for using the same is disclosed. The gas treatment system, comprises: a non-thermal plasma reactor; and a catalyst composition disposed within said non-thermal plasma reactor, said catalyst composition comprising a MZr4(PO4)6, wherein M is a metal selected from the group consisting of platinum, palladium, ruthenium, silver, rhodium, osmium, iridium, and combinations comprising at least one of said foregoing metals. The process comprises exposing said gas to a plasma field and to the catalyst composition.
REFERENCES:
patent: 5891409 (1999-04-01), Hsiao et al.
patent: 6338827 (2002-01-01), Nelson et al.
patent: 6354903 (2002-03-01), Nelson
patent: 6357223 (2002-03-01), Caren et al.
patent: 6368451 (2002-04-01), Goulette et al.
patent: 6423190 (2002-07-01), Hemingway et al.
patent: 6464945 (2002-10-01), Hemingway
patent: 6482368 (2002-11-01), Hemingway et al.
patent: 6537507 (2003-03-01), Nelson et al.
patent: 6638484 (2003-10-01), Nelson et al.
patent: 2000-140642 (2000-05-01), None
Machine Translation of Japanese Patent 2000-140642.
Hemingway Mark
Kupe Joachim
LaBarge William J.
Simpkins Haskell
Delphi Technologies Inc.
Funke Jimmy L.
McDonald Rodney G.
LandOfFree
Non-thermal plasma reactor gas treatment system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Non-thermal plasma reactor gas treatment system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non-thermal plasma reactor gas treatment system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3468921