Non-precipitating quinone diazide polymer containing photoresist

Details Non-precipitating quinone diazide polymer containing photoresist Non-precipitating quinone diazide polymer containing photoresist

1985-10-25

1987-08-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, G03C 154, G03C 158

Patent

active

046845976

ABSTRACT:
There is disclosed a photoresist composition comprising a light-sensitive, quinone diazide polymer, a binder and a benzene monomer trisubstituted with a diazo-naphthoquinone-sulfonyloxy group. The composition is improved in that the diazo-naphthoquinone-sulfonyloxy group occupies the 1,2,4-positions on the benzene ring, whereby improved solubility is achieved.

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patent: 4365019 (1982-12-01), Daly et al.
patent: 4499171 (1985-02-01), Hosaka et al.

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